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Modeling and Microfabrication of a CMOS Resonator for Magnetic Field Measurement

Dennis , John Ojur and Ahmad, Farooq and Md Khir, Mohd Haris and Hamid, Nor Hisham (2012) Modeling and Microfabrication of a CMOS Resonator for Magnetic Field Measurement. In: 2012 4th International Conference on Intelligent and Advanced Systems (ICIAS2012), 12 - 14 June 2012, Covention Centre, Kuala Lumpur, Malaysia.

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Abstract

This paper presents the modeling and microfabrication of a CMOS resonant magnetic field sensor capable of measuring magnetic field in the range of nanotesla. This sensor is based on differential electrostatic along with Lorentz force actuation and piezoresistive sensing. Cadence virtuoso layout is used to design the resonant magnetic sensor for fabrication. Using microfabrication facilities of MIMOS Bhd all CMOS layers i.e. three metal and two poly layers are used to fabricate the magnetic sensor to enhance the sensitivity. At sensor output, without any amplification its sensitivity is 1.4807 mV/mT at 0.001 damping ratio with quality factor 500 and resonant frequency 9.35 kHz.

Item Type:Conference or Workshop Item (Paper)
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
Academic Subject One:CMOS MEMS Resonators
Departments / MOR / COE:Departments > Fundamental & Applied Sciences
ID Code:8798
Deposited By: Dr John Ojur Dennis
Deposited On:16 Jan 2013 02:07
Last Modified:16 Jan 2013 02:07

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