An optimization study on microwave irradiated, decomposition of phenol in the presence of H2O2

B.R., Prasannakumar and I., Regupathi and T., Murugesan (2009) An optimization study on microwave irradiated, decomposition of phenol in the presence of H2O2. [Citation Index Journal]

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Background: Removal of phenol from industrial waste waters involves basic techniques namely extraction, biodegradation, photocatalytic degradation, etc. Among the available processes, the oxidation of phenols using H2O2 is a suitable alternative because of low cost and high oxidizing power. The application of an oxidation process for the decomposition of stable organic compounds in waste water leads to the total degradation of the compounds rather than transferring from one form to another. Since oxidation using Fenton's reagent ismore dependent on pH, in this present work it was proposed to use H2O2 coupled with microwave irradiation. The effects of initial phenol concentration, microwave power and the irradiation time on the amount of decomposition were studied. Results: In the present work experiments were conducted to estimate the percentage degradation of phenol for different initial concentrations of phenol (100, 200, 300, 400 and 500 mg L-1), microwave power input (180, 360, 540, 720 and 900 W) for different irradiation times. The kinetics of the degradation process were examined through experimental data and the decomposition rate follows first-order kinetics. Response surface methodology (RSM) was employed to optimize the design parameters for the present process. The interaction effect between the variables and the effect of interaction on to the responses (percentage decomposition of phenol) of the process was analysed and discussed in detail. The optimum values for the design parameters of the process were evaluated (initial phenol concentration 300 mg L-1, microwave power output 668 W, and microwave irradiation time 60 s, giving phenol degradation 82.39%) through RSM by differential approximation, and were confirmed by experiment. Conclusion: The decomposition of phenol was carried out using H2O2 coupled with microwave irradiation for different initial phenol concentrations, microwave power input and irradiation times. The phenol degradation process follows first-order kinetics. Optimization of the process was carried out through RSM by forming a design matrix using CCD. The optimized conditions were validated using experiments. The information is of value for the scale up of the oxidation process for the removal of phenol from wastewater. © 2008 Society of Chemical Industry.

Item Type:Citation Index Journal
Uncontrolled Keywords:Decomposition rate; Degradation of phenols; Degradation process; Design matrix; Design parameters; Differential approximations; Experimental data; Fenton's reagents; First order kinetics; Industrial wastewaters; Initial concentration; Interaction effect; Irradiation time; Low costs; Microwave power; One-form; Optimization studies; Optimized conditions; Optimum value; Oxidation of phenol; Oxidation process; Phenol concentration; Phenol decomposition; Phenol degradation; Photo catalytic degradation; Response Surface Methodology; Response surface methodology (RSM); Scale-up; Biological water treatment; Charge coupled devices; Chemical oxygen demand; Chemicals removal (water treatment); Concentration (process); Degradation; Experiments; Irradiation; Large scale systems; Microwave generation; Microwave irradiation; Microwave power transmission; Optimization; Organic compounds; Oxidation; Oxidation resistance; Phenols; Photocatalysis; Photodegradation; Radiation; Sewage; Surface properties; Wastewater; Biodegradation; hydrogen peroxide; phenol; article; concentration response; controlled study; decomposition; degradation kinetics; microwave irradiation; oxidation; process optimization; response surface method; scale up; waste component removal; waste water management
Subjects:T Technology > TP Chemical technology
Departments / MOR / COE:Departments > Chemical Engineering
ID Code:572
Deposited By: Prof Dr Thanabalan Murugesan
Deposited On:09 Mar 2010 02:08
Last Modified:19 Jan 2017 08:25

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